NFF (CWB) Phase II

The NFF (CWB) Phase II laboratory occupies a floor area of 750 square meters and consists of a plant room and a cleanroom. The plant room is equipped with facilities to support the operation of the cleanroom. The cleanroom provides class 10,000, class 1,000 and class 100 environments and also houses the equipment for front-end wafer processing. A complete 4" silicon wafer processing line is installed in the cleanroom, offering photolithography, thermal diffusion and oxidation, thin-film deposition, dry/wet etching, metallization, implantation, and mask making services.

Nanosystem Fabrication Facility (CWB)
Rm 2240, 2/F (Lift no. 23),
The Hong Kong University of Science & Technology
Clear Water Bay
Kowloon, Hong Kong

Click here for the enlarged version