Wet Station
D2: HF:H2O(1:100) MILC
| Cleanliness Levels | SEMI-CLEAN |
| Cautions | Don't take the cassette away Don't leave any unnecessary things on the top of the wetstation. |
| Solution | Freckle Etch |
| Temperature | Room Temp |
| Standard Processing Time | about 1.5 min |
| Aim | Silicon Residue Removal |
| Application | Silicon Residue Removal |